Fab 34 in Ireland took delivery this year of its first extreme ultraviolet (EUV) lithography system, a key enabler of Intel 4 process technology. Since its arrival, Intel Ireland teams have been working through the installation phase of the system made by Dutch manufacturer ASML. This week, they reached an important moment when the EUV scanner generated its 13.5-nanometer wavelength light for the first time.
This milestone at the fab in Leixlip, Ireland, is a key step on Intel’s path toward high-volume production of Intel 4 technology and is the first time a high-volume EUV scanner will be used in Europe.
More: Read a full report on the new EUV system on the Intel Ireland Newsroom.