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Volume 12, Issue 02

Intel's 45nm CMOS Technology


Intel Technology Journal - Featuring Intel's recent research and development

ISSN 1535-864X DOI 10.1535/itj.1202.05

  • Volume 12
  • Issue 02
  • Published June 17, 2008

Intel's 45nm CMOS Technology

  Section 9 of 12  

45nm Design for Manufacturing

SUMMARY

Our 45nm technology maintains Moore's Law on a technology with a new transistor technology and dry 193nm lithography. Transistor density is on the 2x trend line and variation scaled. Poly rules were changed to allow simple one-pitch poly patterning with no impact to transistor density or product performance. Extensive modeling of the rules provided design rules that were stable before first product tape-out and robust enough to allow a fast high-volume technology ramp.

  Section 9 of 12  

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