Intel Published Articles Published in or about Q1, 2006
Allain, J. P.; Nieto, M.; Hassaneub, A.; Titoy, V.; Plotkin, P.; Hendricks, M.; Hinson, E.; Chrobak, C.; Van Der Velden, M. H. L.; Rice, B. Effect of Charged-Particle Bombardment on Collector Mirror Reflectivity in EUV Lithography Devices. Proceedings of SPIE—Volume 6151, Emerging Lithographic Technologies X, March 2006.
Ayothi, Ramakrishnan; Yi; Yi; Ober, Christopher K.; Putna, Steve; Yueh, Wang; Cao, Heidi. All-Organic Non-PFOS Nonionic Photoacid Generating Compounds With Functionalized Fluoroorganic Sulfonate Motif for Chemically Amplified Resists. Proceedings of SPIE—Volume 6153, Advances in Resist Technology and Processing XXIII, March 2006.
Balasubramanian, S.; Natarajan, N.; Franza, O.; Gianos, C. Deterministic Low-Latency Data Transfer Across Non-Integral Ratio Clock Domains. 19th International Conference on VLSI Design,2006, held jointly with 5th International Conference on Embedded Systems and Design, January 2006. Pages 781-785. Digital Object Identifier 10.1109/VLSID.2006.71.
Borin, E.; Wang, C.; Wu, Y.; Araujo, G. Software-Based Transparent and Comprehensive Control-Flow Error Detection. International Symposium Code Generation and Optimization, CGO 2006, March2006. Pages 333-345. Digital Object Identifier 10.1109/CGO.2006.33.
Bormann, David S. GALS Test Chip on 130nm Process. Electronic Notes in Theoretical Computer Science, Volume 146, Issue 2, January 2006. Pages 29-40.
Borodovsky, Yan. Marching to the Beat of Moore's Law. Proceedings of SPIE—Volume 6153, Advances in Resist Technology and Processing XXIII, March 2006.
Bowman, K.; Orshansky, M.; Sapatnekar, S.S. Tutorial II: Variability and Its Impact on Design. 7th International Symposium on Quality Electronic Design, March 2006. Page 5. Digital Object Identifier 10.1109/ISQED.2006.141.
Bozzano, Marco; Bruttomesso, Roberto; Cimatti, Alessandro; Franzé, Anders; Hanna, Ziyad; Khasidashvili, Zurab; Palti, Amit; Sebastiani, Roberto. Encoding RTL Constructs for Math SAT: a Preliminary Report. Electronic Notes in Theoretical Computer Science, Volume 144, Issue 2, January 2006. Pages 3-4.
Bratton, Daniel; Ayothi, Ramakrishnan; Felix, Nelson; Cao, Heidi; Deng, Hai; Ober, Christopher K. Molecular Glass Resists for Next Generation Lithography. Proceedings of SPIE—Volume 6153, Advances in Resist Technology and Processing XXIII, March 2006.
Brevnov, Dmitri A.; Womack, Robin L.; Atanassov, Plamen; López, Gabriel P.; Bauer, Todd M.; Chaudhury, Zariff A.; Schwappach, Chris D.; Mosley, Larry E. Width of Anodization Mask Required toPreserve a Metallic Phase during Porous-Type Anodization of Aluminum-Copper Films. J. Electrochem. Soc., Volume 153, Issue 3, 2006. Pages B108-B112.
Burnett, John H.; Kaplan, Simon G.; Shirley, Eric L.; Horowitz, Deane; Clauss, Wilfried; Grenville, Andrew; Peski, Chris Van. High-Index Optical Materials for 193nm Immersion Lithography. Proceedings of SPIE—Volume 6154, Optical Microlithography XIX, March 2006.
Chen, Yen-Kuang; Li, Eric Q.; Zhou, Xiaosong; Ge, Steven. Implementation of H.264 Encoder and Decoder on Personal Computers. Journal of Visual Communication and Image Representation, Volume17, Issue 2, April 2006. Pages 509-532.
Chen, Yijian; Yashesh Shroff, Yashesh. The Effects of Wafer-Scan Induced Image Blur on CD Control, Image Slope, and Process Window in Maskless Lithography. Proceedings of SPIE—Volume6151, Emerging Lithographic Technologies X, March 2006.
Debnath, G.; Thadikaran, P. Design Challenges for High Performance Nano-Technology. 19th International Conference on VLSI Design, held jointly with 5th International Conference on Embedded Systems and Design, January 2006. Pages 12-13. Digital Object Identifier 10.1109/VLSID.2006.64.
Fedynyshyn, Theodore H.; Sinta, R. F.; Astolfi, D. K.; Cabral, Alberto; Roberts, J.; Meagley,R. Deconstructing the Resist to Probe Innate Material Roughness. Proceedings of SPIE—Volume6153, Advances in Resist Technology and Processing XXIII, March 2006.
Fetzer, E.S.; Dahle, D.; Little, C.; Safford, K. The Parity Protected, Multithreaded Register Files on the 90-nm Itanium Microprocessor. IEEE Journal of Solid-State Circuits, Volume 41, Issue1, January 2006. Pages 246-255. Digital Object Identifier 10.1109/JSSC.2005.859884
Fischer, T.; Desai, J.; Doyle, B.; Naffziger, S.; Patella, B. A 90-nm Variable Frequency Clock System for a Power-Managed Itanium Architecture Processor. IEEE Journal of Solid-State Circuits,Volume 41, Issue 1, January 2006. Pages 218-228. Digital Object Identifier 10.1109/JSSC.2005.859879.
Fryer, David; Singh, Vivek; Muray, Andrew; Dhoot, Sushil; Sivakumar, Sam. Defect Marginality Screen for Resists Patterned in Random Bright Field Layout. Proceedings of SPIE—Volume 6153, Advances in Resist Technology and Processing XXIII, March 2006.
Gandhi, A.; Akkary, H.; Rajwar, R.; Srinivasan, S.T.; Lai, K. Scalable Load and Store Processing in Latency-Tolerant Processors. IEEE on Micro, Volume 26, Issue 1, January – February2006. Pages 30-39. Digital Object Identifier 10.1109/MM.2006.21.
Grundy, Jim; Melham, Tom; Krstic, Sava; McLaughlin, Sean. Tool Building Requirements for an API to First-Order Solvers. Electronic Notes in Theoretical Computer Science, Volume 144, Issue 2, January 2006. Pages 15-26.
He, M.Y.; Poulton, J. A CMOS Mixed-Signal Clock and Data Recovery Circuit for OIF CEI-6G+Backplane Transceiver. IEEE Journal of Solid-State Circuits, Volume 41, Issue 3, March 2006.Pages 597-606. Digital Object Identifier 10.1109/JSSC.2006.869792.
Hill, S. B.; Ermanoski, I.; Grantham, S.; Tarrio, C.; Lucatorto, T. B.; Madey, T. E.; Bajt, S.;Chandhok, M.; Yan, P.; Wood, O.; Wurm, S.; Edwards, N. V. EUV Testing of Multilayer Mirrors:Critical Issues. Proceedings of SPIE—Volume 6151, Emerging Lithographic Technologies X, March 2006.
Hon, Man Chung. Spec-Based Flip-Flop and Latch Repeater Planning. Proceedings of the 2006 Conference on Asia South Pacific Design Automation, January 2006. Pages 326-331.
Hong, Jumnit; Nurvitadhi, Eriko; Lu, Shih-Lien L. Design, Implementation, and Verification ofActive Cache Emulator (ACE). Proceedings of the International Symposium on Field Programmable GateArrays, February 2006. Pages 63-72.
Hsu, S.K.; Mathew, S.K.; Anders, M.A.; Zeydel, B.R.; Oklobdzija, V.G.; Krishnamurthy, R.K.;Borkar, S.Y. A 110 GOPS/W 16-bit Multiplier and Reconfigurable PLA Loop in 90-nm CMOS. IEEEJournal on Solid-State Circuits, Volume 41, Issue 1, January 2006. Pages 256-264. Digital Object Identifier 10.1109/JSSC.2005.859893.
Huggins, Kevin; Tsuyoshi, Toki; Ong; Meng; Rafac, Robert; Treadway, Christopher; Choudhary,Devashish; Kudo, Takehito; Hirukawa, Shigeru; Renwick, Stephen P.; Farrar, Nigel R. Effects ofLaser Bandwidth on OPE in a Modern Lithography Tool. Proceedings of SPIE—Volume 6154, Optical Microlithography XIX, March 2006.
Hussein, M.A.; Turkot, R.B., Jr. Particle Control in Dielectric Etch Chamber. IEEE Transactions on Semiconductor Manufacturing, Volume 19, Issue 1, February 2006. Pages 146-155.Digital Object Identifier 10.1109/TSM.2005.863224.
Hutapea, Parsaoran; Grenestedt, Joachim L.; Modi; Mitul; Mello, Michael; Frutschy, Kristopher.Prediction of Microelectronic Substrate Warpage Using Homogenized Finite Element Models. Microelectronic Engineering, Volume 83, Issue 3, March 2006. Pages 557-569.
Iyer, P.; Jain, S.; Casper, B.; Howard, J. Testing High-Speed IO Links Using On-Die Circuitry. 19th International Conference on VLSI Design, held Jointly with 5th International Conference on Embedded Systems and Design, January 2006. Pages 807-810. Digital Object Identifier 10.1109/VLSID.2006.159.
Jaleel, A.; Mattina, M.; Jacob, B. Last Level Cache (LLC) Performance of Data Mining Workloads on a CMP—a Case Study of Parallel Bioinformatics Workloads. Twelfth International Symposium on High-Performance Computer Architecture, February 2006. Pages 88-98. Digital Object Identifier10.1109/HPCA.2006.1598115.
Jarnagin, N. D.; Gonsalves, K. E.; Wang, M. X.; Roberts, J. M.; Yueh, W. Resists for Sub-100nm Patterning at 193nm Exposure. Proceedings of SPIE—Volume 6153, Advances in Resist Technology and Processing XXIII, March 2006.
Jianhui Li; Qi Zhang; Shu Xu; Bo Huang. Optimizing Dynamic Binary Translation for SIMD Instructions. International Symposium on Code Generation and Optimization, March 2006. Pages 269-280. Digital Object Identifier 10.1109/CGO.2006.27.
Jiao, Y.; Fan, S.; Miller, D.A.B. Systematic Photonic Crystal Device Design: Global and Local Optimization and Sensitivity Analysis. IEEE Journal of Quantum Electronics, Volume 42, Issue 3,March 2006. Pages 266-279. Digital Object Identifier 10.1109/JQE.2005.862038.
Jones, Ronald L.; Wu, Wen-li; Wang, Cheng-qing; Lin, Eric K.; Choi, Kwang-Woo; Rice, Bryan J.; Thompson, George M.; Weigand, Steven J.; Keane, Denis T. Characterization of Line Edge Roughness Using CD SAXS. Proceedings of SPIE—Volume 6152, Metrology, Inspection, and Process Control for Microlithography XX, March 2006.
Kang, Wei; Mao, John. Benchmark Comparison of Multiple Process Control Strategies for Lithographic CD control. Proceedings of SPIE—Volume 6152, Metrology, Inspection, and Process Control for Microlithography XX, March 2006.
Kilic, B.; Madenci, E.; Mahajan, R. Energy Release Rate and Contact Zone in a Cohesive and an Interface Crack by Hypersingular Integral Equations. International Journal of Solids andStructures, Volume 43, Issue 5, March 2006. Pages 1159-1188.
Kocsis, Michael; van den Heuvel, Dieter; Gronheid, Roel; Maenhoudt, Mireille; Vangoidsenhoven, Dizana; Wells, Greg; Stepanenko, Nickolay; Benndorf, Michael; Kim, Hyun Woo; Kishimura, Shinji; Ercken, Monique; Van Roey, Frieda; O'rien, S.; Fyen, Wim; Foubert, Philippe; Moerman, Richard; Streefkerk, Bob. Immersion Specific Defect Mechanisms: Findings and Recommendations for Their Control. Proceedings of SPIE—Volume 6154, Optical Microlithography XIX, March 2006.
Lacopi, F.; Travaly, Y.; Eyckens, B.; Waldfried, C.; Abell, T.; Guyer, E. P.; Gage, D. M.; Dauskardt, R. H.; Sajavaara, T.; Houthoofd, K.; Grobet, P.; Jacobs, P.; Maex, K.. Short-Ranged Structural Rearrangement and Enhancement of Mechanical Properties of Organosilicate Glasses Inducedby Ultraviolet Radiation. Journal of Applied Physics, March 2006, Volume 99.
Lavery, Kristopher A.; Choi, Kwang-Woo; Vogt, Bryan D.; Prabhu, Vivek M.; Lin, Eric K.; Wu, Wen-li; Satija, Sushil K.; Leeson, Michael J.; Cao, Heidi B.; Thompson, George; Deng, Hai; Fryer,David S. Fundamentals of the Reaction-Diffusion Process in Model EUV Photoresists. Proceedings of SPIE—Volume 6153, Advances in Resist Technology and Processing XXIII, March 2006.
Lee, Cheng-Tsung; Jarnagin, Nathan D.; Wang, Mingxing; Gonsalves, Kenneth E.; Roberts, Jeanette M.; Yueh, Wang; Henderson, Clifford L. Fundamental Studies of the Properties of Photoresists Based on Resins Containing Polymer-Bound Photoacid Generators. Proceedings of SPIE—Volume 6153, Advances in Resist Technology and Processing XXIII, March 2006.
Lee, Kyung M.; Yedur, Sanjay; Henrichs, Sven; Tavassoli, Malahat. CD-Etch Depth Measurement from Advanced Phase-Shift Masks and Wafers Using Optical Scatterometry. Proceedings of SPIE—Volume 6152, Metrology, Inspection, and Process Control for Microlithography XX, March 2006.
Lee, Sang H.; Brewer, Courtney; Chandhok, Manish. Process Window Study with Various Partial Coherences on EUV MET (micro exposure tool) Optics. Proceedings of SPIE—Volume 6151, EmergingLithographic Technologies X, March 2006.
Liao, S.; Du; Z.; Wu, G.; Lueh, G. Data and Computation Transformations for Brook StreamingApplications on Multiprocessors. International Symposium on Code Generation and Optimization, March2006. Pages 196-207. Digital Object Identifier 10.1109/CGO.2006.13.
Liberman, V.; Switkes, M.; Rothschild, M.; Palmacci, S.T.; Grenville, A. Studies of Consequences of Photo-Acid Generator Leaching in 193nm Immersion Lithography. Proceedings of SPIE
—Volume 6154, Optical Microlithography XIX, March 2006.
Liu, A.; Rong, H.; Jones, R.; Cohen, O.; Hak, D.; Paniccia, M. Optical Amplification andLasing by Stimulated Raman Scattering in Silicon Waveguides. Journal of Lightwave Technology,Volume 24, Issue 3, March 2006. Pages 1440-1455. Digital Object Identifier 10.1109/JLT.2005.863322.
Long, M.; Wu, C.-H. Energy-Efficient and Intrusion-Resilient Authentication for Ubiquitous Access to Factory Floor Information. IEEE Transactions on Industrial Informatics, Volume 2, Issue1, February 2006. Pages 40-47. Digital Object Identifier 10.1109/TII.2005.864144.
Ma, H. B.; Wilson, C.; Borgmeyer, B.; Park, K.; Yu, Q.; Choi, S. U. S.; Tirumala, Murli.Effect of Nanofluid on the Heat Transport Capability in an Oscillating Heat Pipe. Applied Physics Letters, Volume 88, April 2006.
Ma, Jian; Farnsworth, Jeff; Bassist, Larry; Cui, Ying; Mammen, Bobby; Padmanaban, Ramaswamy; Nadamuni, Venkatesh; Kamath, Muralidhar; Buckmann, Ken; Neff, Julie; Freiberger, Phil.Development of an Automated Multiple-Target Mask CD Disposition System to Enable New Sampling Strategy. Proceedings of SPIE—Volume 6152, Metrology, Inspection, and Process Control for Microlithography XX, March 2006.
Maris, Humphrey J.; Antonelli, G. Andrew; Ford, Wayne K.; Morath, Christopher J.; Stoner,Robert J.; Tas, Guray. Non-Destructive Testing Using Picosecond Ultrasonics. AIP Conference Proceedings, Volume 820, Issue 1, March 2006. Pages 210-217.
McCloskey, Bill; Zhou, Feng; Gay, David; Brewer, Eric. Autolocker: Synchronization Inference for Atomic Sections. Conference record of the 33rd ACM SIGPLAN-SIGACT Symposium on Principles of Programming Languages, January 2006. Pages 346-358.
McGowen, R.; Poirier, C.A.; Bostak, C.; Ignowski, J.; Millican, M.; Parks, W.H.; Naffziger, S.Power and Temperature Control on a 90- nm Itanium Family Processor. IEEE Journal of Solid-State Circuits, Volume 41, Issue 1, January 2006. Pages 229-237. Digital Object Identifier 10.1109/JSSC.2005.859902.
Menon, Vijay S.; Glew, Neal; Murphy, Brian R.; McCreight, Andrew; Shpeisman, Tatiana; Adl-Tabatabai, Ali-Reza; Petersen, Leaf. A Verifiable SSA Program Representation for Aggressive Compiler Optimization. Conference Record of the 33rd ACM SIGPLAN-SIGACT Symposium on Principles of Programming Languages, January 2006. Pages 397-408.
Miaobo, C.; Goldenberg, S.; Srinivas, S.; Ushakov, V.; Wang, Y.; Qi, Z.; Lin, E.; Zach, Y.Java JNI Bridge: A Framework for Mixed Native ISA Execution. International Symposium on Code Generation and Optimization, March, 2006. Pages 65-75. Digital Object Identifier 10.1109/CGO.2006.22.
Mitra, S.; Kim, K.S. XPAND: An Efficient Test Stimulus Compression Technique. IEEETransactions on Computers, Volume 55, Issue 2, February 2006. Pages 163-173. Digital Object Identifier 10.1109/TC.2006.31.
Obradovic, B.; Kotlyar, R.; Heinz, F.; Matagne, P.; Rakshit, T.; Giles, M. D.; Stettler, A.; Nikonov, D. E. Analysis of Graphene Nanoribbons as a Channel Material for Field-Effect Transistors. Applied Physics Letters, Volume 88, April 2006.
Ong, Shao Chee. Enabling Test-Time Optimized Pseudorandom Bit Stream (PRBS) 2^31 BER Testing on Automated Test Equipment for 10Gbps Device. Third IEEE International Workshop on Electronic Design, Test and Applications, January 2006. Pages 68-73. Digital Object Identifier 10.1109/DELTA.2006.44.
Pan, Sung-Jui (Song-Ra); Cheng, Kwang-Ting; Moondanos, John; Hanna, Ziyad. Generation ofShorter Sequences for High Resolution Error Diagnosis Using Sequential SAT. Proceedings of the 2006 Conference on Asia South Pacific Design Automation, January 2006. Pages 25-29.
Peterson, Larry; Roscoe, Timothy. The Design Principles of PlanetLab. ACM SIGOPS Operating Systems Review, Volume 40, Issue 1, January 2006. Pages 11-16.
Ramanathan, S.; Chrysler, G.M. Solid-State Refrigeration for Cooling Microprocessors. IEEE Transactions on Components and Packaging Technologies [see also IEEE Transactions on Components,Packaging and Manufacturing Technology, Part A: Packaging Technologies] Volume 29, Issue 1, March 2006. Pages 179-183. Digital Object Identifier 10.1109/TCAPT.2006.
Raub, Alex K.; Biswas, Abani M.; Borodovsky, Y.; Allen, G.; Brueck, S. R. J. Simulation ofDense Contact Hole (1=0.35) Arrays with 193 nm Immersion Lithography. Proceedings of SPIE—Volume 6154, Optical Microlithography XIX, March 2006.
Ritenour, A.; Khakifirooz, A.; Antoniadis, D.A.; Lei, R. Z.; Tsai, W.; Dimoulas, A.; Mavrou, G.; Panayiotatos, Y. Subnanometer-Equivalent-Oxide-Thickness Germanium P-Metal-Oxide-SemiconductorField Effect Transistors Fabricated Using Molecular-Beam-Deposited High-K/Metal Gate Stack. Applied Physics Letters, Volume 88, April 2006.
Roberts, Jeanette M.; Meagley, Robert; Fedynyshyn, Theodore H.; Sinta, Roger F.; Astolfi, David K.; Goodman, Russell B.; Cabral, Alberto. Contributions to Innate Material Roughness in Resist. Proceedings of SPIE—Volume 6153, Advances in Resist Technology and Processing XXIII, March 2006.
Shroff, Yashesh A.; Goldstein, Michael; Rice, Bryan; Lee, Sang H.; Ravi, K. V.; Tanzil, Daniel.EUV Pellicle Development for Mask Defect Control. Proceedings of SPIE—Volume 6151, Emerging Lithographic Technologies X, March 2006.
Slonaker, Steve D.; Phillips, Mark C.; Treadway, Chris; Darby, Greg; Johnson, Kurt; Moore, Bob. Advances in Imaging Tool Adjustment Optimization Methodologies and Capabilities Including Impact Upon Imaging Performance Budget Components. Proceedings of SPIE—Volume 6154, Optical Microlithography XIX, March 2006.
Soderquist, P.; Leeser, M.; Rojas, J.-C. Enabling MPEG-2 Video Playback in Embedded Systemsthrough Improved Data Cache Efficiency. IEEE Transactions on Multimedia, Volume 8, Issue 1,February 2006. Pages 81-89. Digital Object Identifier 10.1109/TMM.2005.861289.
Stepanenko, N.; Kim, Hyun-Woo; Kishimura, S.; van den Heuvel, D.; Vandenbroeck, N.; Kocsis, M.; Foubert, P.; Maenhoudt, M.; Ercken, M.; Van Roey, Frieda; Gronheid, R.; Pollentier, I.; Vangoidsenhoven, D.; Delvaux, C; Baerts, C.; O'Brien, S.; Fyen, W.; Wells, G. Top Coat or No Top Coat for Immersion Lithography?Proceedings of SPIE—Volume 6153, Advances in Resist Technology and Processing XXIII, March, 2006.
Want, R. An Introduction to RFID Technology. IEEE Pervasive Computing, Volume 5, Issue 1, January - March 2006. Pages 25-33. Digital Object Identifier 10.1109/MPRV.2006.2.
Want, R. Grasping the Torch. IEEE Pervasive Computing, Volume 5, Issue 1, January – March 2006. Pages 4-6. Digital Object Identifier 10.1109/MPRV.2006.7.
Webb, Clair. Layout Rule Trends and Effect upon CPU Design. Proceedings of SPIE—Volume6156, Design and Process Integration for Microelectronic Manufacturing IV, March 2006.
Yang, Shih-yu; Papachristou, C.A. A Method for Detecting Interconnect DSM Defects in Systems on Chip. IEEE Transactions on Computer- Aided Design of Integrated Circuits and Systems, Volume 25, Issue 1, January 2006. Pages 197-204. Digital Object Identifier 10.1109/TCAD.2005.853707.
Zhang, Chengliang; Ding, Chen; Ogihara, Mitsunori; Zhong, Yutao; Wu, Youfeng. A Hierarchical Model of Data Locality. Conference Record of the 33rd ACM SIGPLAN-SIGACT Symposium on Principles of Programming Languages, January 2006. Pages 16-29.
Zhang, K.; Bhattacharya, U.; Zhanping, C.; Hamzaoglu, F.; Murray, D.; Vallepalli, N.; Wang, Y.; Zheng, B.; Bohr, M. A 3-GHz 70-MB SRAM in 65-nm CMOS Technology with Integrated Column-Based Dynamic Power Supply. IEEE Journal of Solid-State Circuits, Volume 41, Issue 1, January 2006. Pages 146-151. Digital Object Identifier 10.1109/JSSC.2005.859025.
Zhuoyu B.; Kumar, S.A.; Wu, D.M.; Natarajan, V.K.; Lin, M. A Low Cost, High Quality Embedded Array DFT Technique for High Performance Processors. Third IEEE International Workshop onElectronic Design, Test and Applications, January 2006. Pages 57-63. Digital Object Identifier 10.1109/DELTA.2006.5.