Hello, I'm Ciaran and I work in the Ion Implant area.
This is where we make the actual transistors on the wafer surface. We use either boron, phosphorus or arsenic atoms to create conducting areas in the silicon. These areas act like little micro-switches which can turn on and off the microcircuit.
We heat either boron, phosphorus or arsenic to give off atoms. We convert the atoms to ions by removing an electron. The ions travel through the implant tool. We direct the ions towards the wafers where they are implanted at high speed into the silicon. This is a bit like shooting pellets into sand. We now move to the Thin Films area.
