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Intel® 22nm Technology

Introducing 3-D transistors manufactured at 22nm for future microprocessor families, continuing pursuit of Moore's Law.

Intel Introduces Tri-Gate Transistors for Superior Performance

Presentation: Innovations in 22-nm transistor technology include tri-gate transistors, which improve performance and energy efficiency.

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Intel® Atom™ Chips Manage Car Propulsion System

Video: BLOODHOUND SSC manages calculations behind car propulsion systems with three Intel® Atom™ chips.

Intel® Atom™ Processor HD

Video: Intel® Atom™ Processor HD.

Optimize 32nm SoC Platform Technology, 2nd Generation High-k/Met

Paper covers optimization for a 32nm SoC platform with 2nd Generation high-k/Metal gate transistors.

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Presentation: Low Power Optimize a 32nm SoC Platform Technology

Presentation: low power optimization for a 32nm SoC platform with 2nd generation high-k/Metal gate transistors.

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Presentation: RF CMOS Technology Scaling in High-k/Metal Gate Era

Presentation examines the impacts and benefits of RF CMOS technology scaling in high-k/Metal gate era for RF SoC (System-on-Chip) applications.

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Gate Dielectric Scaling for CMOS: from SiO2/PolySi to High-K/Metal-Gate

Presentation covers SiO2 scaling, high-k/metal-gate problems, breakthroughs, and performance reports for NMOS and PMOS transistors.

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Gate Dielectric Scaling for High-Performance CMOS: SiO2 to High-K

Gate Dielectric Scaling for High-Performance CMOS: SiO2 to High-K, an option for the 45nm high-performance logic technology node.

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Advanced High-K Gate Dielectric for Short-Channel in QWFE Transistors on Silicon Substrate

Paper: composite high-K gate in the QWFET silicon substrate integration for thin electrical oxide, low gate leakage, and carrier confinement.

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