The browser version you are using is not recommended for this site.Please consider upgrading to the latest version of your browser by clicking one of the following links.
We are sorry, This PDF is available in download format only
Introduction to Intel’s 32nm Process TechnologyIntel has been in high-volume manufacturing on its 32-nm process technology with second generation high-k + metal gate transistors since Q4, 2009. This process technology builds upon the tremendously successful 45-nm process technology–the first to use high-k + metal gate transistors–introduced a couple of years before.Building upon the 45-nm process technology that led to the launch of the initial Intel® Core™ i7, i5, and i3 processor family based on Intel® microarchitecture code name Nehalem, Intel began high-volume production with its 32-nm process technology with second generation high-k + metal gate transistors in late 2009. This 32-nm process technology is being used to manufacture the latest versions of processors based on the Intel® microarchitecture code name Nehalem. Intel offers these 32-nm-based products across all computer market segments–embedded, mobile, desktop, and server. Intel is a leader in semiconductor manufacturing process technology and was the first company shipping 32-nm microprocessors for PCs–and the only company for well over a year. Intel is on track with its cadence of new product innovation–known as the “Tick-Tock” model–that delivers alternating new generations of advanced manufacturing process technology and processor microarchitecture every year: first the “tick” of a new manufacturing process technology applied to the existing processor microarchitecture, then the “tock" of a new processor microarchitecture built on the latest manufacturing process.To understand the significance of 32-nm, we must first take a look back at 45-nm process technology and high-k + metal gate transistors:To better understand the significance of the 32-nm process technology, it is helpful to look back and revisit the 45-nm process technology introduction that occurred in 2007. The Intel 45-nm process that enabled Intel to launch the incredibly successful and high-performing Intel microarchitecture codenamed Nehalem was the first to introduction high-k + metal gate transistors–a technological breakthrough that enabled higher-performing transistors while simultaneously reducing leakage currents. At the introduction of the 45-nm process technology, Intel promised a fast and meaningful ramp of the 45-nm technology.Read the full 32-nm Process Technology White Paper.
See how the new transistor process and tri-gate fin design enable greater computing experiences.
Video shows storage possibilities powered by Intel® Architecture
See how three Intel® Atom™ chips manage calculations behind propulsion system in BLOODHOUND SSC.
Intel® Atom™ platform presentation at IDF 2011
John Cormican, demonstrates Intel® Virtualization Technology at Embedded World 2010.