Microsoft PowerPoint - SF14_SPCS010_101f.pptx

Microsoft PowerPoint - SF14_SPCS010_101f.pptx

Microsoft PowerPoint - SF14_SPCS010_101f.pptx

Explore Intel Fellow Mark Bohr's presentation from Intel Developer Forum 2014, with details and benefits of the new 14 nm transistor process and how the tri-gate fins are now taller, thinner, and closer together, enabling more performance, less active power, and longer battery life for greater computing experiences.

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