Intel Resale Corporation is a wholly owned subsidiary of Intel Corporation, not a broker. Our charter is to disposition all of Intel Corporation’s excess assets including used fab, assembly, and test semiconductor equipment. Our primary strategy is to sell excess equipment to end-users either directly, through refurbishers, or end-user designated 3rd parties. We are able to offer significant quantities of a variety of makes and models at competitive pricing from our US and international factory floors and warehouses. While our equipment is offered “as-is where-is”, Intel Resale Corporation has a reputation for providing quality used equipment based on Intel’s maintenance, deinstallation, and storage procedures. We invite you to review the makes and models we have in inventory and contact the appropriate regional Account Manager for further information. Our Account Managers have access to a dedicated OEM Account Manager and Engineer as well as the Intel factory network to meet our customers’ needs.
See an alphabetical inventory of available products below and click here for contact information for Regional Sales Managers.
Current inventory of 200mm and 300mm equipment (make, model, description only, not quantities).
List last updated Septemeber 19, 2011
| SUPPLIER NAME | MODEL | DESCRIPTION | CEID | WAFER SIZE | FUNCTIONAL AREA |
|---|---|---|---|---|---|
| ADE CORPORATION | 9500 | FLATNESS TESTER GOLD | ADEgg | 200mm | METROLOGY |
| AGILENT TECHNOLOGIES INC | 4062 | PARAMETRIC TESTER FAB, CU | ECDct / ECDtx | N/A | TEST |
| APPLIED MATERIALS INC/AMAT | 5000 | PECVD NITRIDE | AMP | 200mm | THIN FILMS |
| APPLIED MATERIALS INC/AMAT | TPCC | RADIANCE | RTAfr | 200mm | DIFFUSION |
| APPLIED MATERIALS INC/AMAT | 5200 CENTURA | RTP BPSG/LD/ANNEAL/SD | RTAbp | 200mm | DIFFUSION |
| APPLIED MATERIALS INC/AMAT | 5200 CENTURA | RTP GATE-TOXIC | RTAga | 200mm | DIFFUSION |
| APPLIED MATERIALS INC/AMAT | 5200 CENTURA | RTP SAL-NON TOXIC | RTAsa | 200mm | DIFFUSION |
| APPLIED MATERIALS INC/AMAT | 5200 ULTIMA | HDP ILD1 TO N, CU | HDPcu | 200mm | THIN FILMS |
| APPLIED MATERIALS INC/AMAT | 5200 ULTIMA | HDP PSG ILD0 | HDPps | 200mm | THIN FILMS |
| APPLIED MATERIALS INC/AMAT | 5200 ULTIMA | HDP STI | HDPst | 200mm | THIN FILMS |
| APPLIED MATERIALS INC/AMAT | 5200 ULTIMA | HDP ILD0 | HDPxx | 200mm | THIN FILMS |
| APPLIED MATERIALS INC/AMAT | 5500 ENDURA | ADHESION CVD 1BC | ADHlt | 200mm | THIN FILMS |
| APPLIED MATERIALS INC/AMAT | 5500 ENDURA | CU BARRIER/SEED HVM (SIP CHAMBERS) | CBScu | 200mm | THIN FILMS |
| APPLIED MATERIALS INC/AMAT | 5500 ENDURA | SPUTTER TNAN | SPTna | 200mm | THIN FILMS |
| APPLIED MATERIALS INC/AMAT | 5500 ENDURA | SPUTTER TNCOA | SPTsa | 200mm | THIN FILMS |
| APPLIED MATERIALS INC/AMAT | 5500 ENDURA | SPUTTER TNAA | SPTxx | 200mm | THIN FILMS |
| APPLIED MATERIALS INC/AMAT | MIRRA | CMP/SCRUBBER-TW REGEN, CU | CMPct | 200mm | PLANARIZATION |
| APPLIED MATERIALS INC/AMAT | MIRRA | CMP/SCRUBBER, CU | CMPcu | 200mm | PLANARIZATION |
| APPLIED MATERIALS INC/AMAT | MIRRA | CMP/SCRUBBER-ILD | CMPil | 200mm | PLANARIZATION |
| APPLIED MATERIALS INC/AMAT | MIRRA | CMP/SCRUBBER-STI | CMPst | 200mm | PLANARIZATION |
| APPLIED MATERIALS INC/AMAT | MIRRA | CMP/SCRUBBER-TW REGEN | CMPtw | 200mm | PLANARIZATION |
| APPLIED MATERIALS INC/AMAT | MIRRA | CMP/SCRUBBER, TUNGSTEN | CMPwp | 200mm | PLANARIZATION |
| APPLIED MATERIALS INC/AMAT | MIRRA MESA | POLISHER, CU | COPcu | 200mm | PLANARIZATION |
| APPLIED MATERIALS INC/AMAT | SEM VISION | AUTO DEFECT REVIEW SEM/EDX | NKSdm | 200mm | METROLOGY |
| APPLIED MATERIALS INC/AMAT | SEM VISION | AUTO DEFECT REVIEW SEM/EDX+HI RES | NKSdy | 200mm | METROLOGY |
| APPLIED MATERIALS INC/AMAT | XR80 | LOW ENERGY IMPLANTER - LEAP II | IMPlp | 200mm | IMPLANT |
| APPLIED MATERIALS INC/AMAT | XR80 | LOW ENERGY IMPLANTER - LEAP I | IMPlx | 200mm | IMPLANT |
| ASML US INC | MSX | STEPPER DUV | DSBxx | 200mm | LITHOGRAPHY |
| AXCELIS TECHNOLOGIES INC | 200 PCU | DUV CURE | DUVxx | 200mm | LITHOGRAPHY |
| BALL-TECH ENERGY LTD. | MET011 | CARBON COATER | COTcc | N/A | LAB ANALYSIS |
| BROOKS AUTOMATION INC | 100-0146 | AUTO RETICLE MACRO INSPECTION | ARMli | N/A | FAB SUPPORT |
| CASCADE MICROTECH DRESDEN GMBH | MA200 | MASK ALIGNER (C4) | KARxx | 200mm | LITHOGRAPHY |
| FORTREND ENGINEERING CORP | F8225 | DUAL STAGE LOT SPLITTER | CTCda | 200mm | WAFER HANDLING |
| HEWLETT PACKARD COMPANY | FAT 5 | TESTER | VFTts | 200mm | METROLOGY |
| HITACHI HTA | 8820 | CD SEM 8820 | CD bb | 200mm | METROLOGY |
| HITACHI HTA | 308 | ETCHER | HITxx | 200mm | ETCH |
| HITACHI HTA | M712E | ETCHER | STRde | 200mm | ETCH |
| HITACHI HTA | M511E | POLY ETCHER | PLYxx | 200mm | ETCH |
| HITACHI HTA | S8840 | CD SEM S8840 | CDAxx | 200mm | METROLOGY |
| HITACHI HTA | S9300 | CD SEM S9300 | CDBli | 200mm | METROLOGY |
| HITACHI HTA | S9300 | 193 NM CD SEM | CDBup | 200mm | METROLOGY |
| KLA TENCOR CORPORATION | 2135 | DEFECT INSPECTION | KLAcu | 200mm | METROLOGY |
| KLA TENCOR CORPORATION | 2139 | BRIGHT FIELD PATTERN SYSTEM | BPSdm | 200mm | METROLOGY |
| KLA TENCOR CORPORATION | 5240 | PARC OPTIPROBE | PHMxx | 200mm | METROLOGY |
| KLA TENCOR CORPORATION | 6200 | SURFSCAN BARE | TSBaa | 200mm | METROLOGY |
| KLA TENCOR CORPORATION | 6220 | SURFSCAN BARE, CU | TSBdm | 200mm | METROLOGY |
| KLA TENCOR CORPORATION | 2600B | OPTIPROBE | TG xx | 200mm | METROLOGY |
| KLA TENCOR CORPORATION | 5341E | OPTIPROBE WITH WAFER BOW AND OCD | SHMnc | 200mm | METROLOGY |
| KLA TENCOR CORPORATION | AIT | DEFECT INSPECTION | AITaa | 200mm | METROLOGY |
| KLA TENCOR CORPORATION | AIT UV+ | FUSION UV+ DARKFIELD | FUVdy | 200mm | METROLOGY |
| KLA TENCOR CORPORATION | AIT2 | DARK FIELD INSPECTION SYSTEM | DISdm | 200mm | METROLOGY |
| KLA TENCOR CORPORATION | FLX2320 | PROFILOMETER | FLXxx | 200mm | METROLOGY |
| KLA TENCOR CORPORATION | FT750 | FILM THICKNESS | PFTbb | 200mm | METROLOGY |
| KLA TENCOR CORPORATION | QUANTOX 64100 | GATE OXIDE SURFACE CHARGE | GOSxx | 200mm | METROLOGY |
| KLA TENCOR CORPORATION | RS-100-8 | SHEET RESISTIVITY | SREnc | 200mm | METROLOGY |
| KLA TENCOR CORPORATION | RS55 | OMNIMAP | OM xx | 200mm | METROLOGY |
| KNT ENGINEERING LTD | RX130-CR | AUTOLOADER FOR BLUE-M OVENS | KRRxx | N/A | FAB SUPPORT |
| KOKUSAI SEMICONDUCTOR EQUIPMENT CORPORATION | VERTRON III | VDF-ATM-PI CURE/ALLOY | VDFal | 200mm | DIFFUSION |
| KOKUSAI SEMICONDUCTOR EQUIPMENT CORPORATION | VERTRON III | VDF-ATM-ALLOY-RC, CU | VDFca | 200mm | DIFFUSION |
| KOKUSAI SEMICONDUCTOR EQUIPMENT CORPORATION | VERTRON III | VDF-CVD-FLAT POLY | VDFfp | 200mm | DIFFUSION |
| KOKUSAI SEMICONDUCTOR EQUIPMENT CORPORATION | VERTRON III | VDF-CVD-ISOLATION | VDFin | 200mm | DIFFUSION |
| KOKUSAI SEMICONDUCTOR EQUIPMENT CORPORATION | VERTRON III | VDF-CVD-NITRIDE/BTBAS SPACER | VDFsp | 200mm | DIFFUSION |
| KOKUSAI SEMICONDUCTOR EQUIPMENT CORPORATION | VERTRON III | VDF-CVD-TIP SPACER | VDFtp | 200mm | DIFFUSION |
| LAM RESEARCH CORP/LRC | 4428 | HARDMASK ETCHER | LRChm | 200mm | ETCH |
| LAM RESEARCH CORP/LRC | 4428 | NITRIDE ETCHER | LRCnx | 200mm | ETCH |
| LAM RESEARCH CORP/LRC | 4428 | POLY ETCHER | LRCpo | 200mm | ETCH |
| LAM RESEARCH CORP/LRC | 4528 | OXIDE ETCHER | OXEpx | 200mm | ETCH |
| LAM RESEARCH CORP/LRC | 4528 | OXIDE ETCHER | OXExx | 200mm | ETCH |
| LAM RESEARCH CORP/LRC | 200 SERIES 2 | DOUBLE SIDED SCRUBBER | WSCot | 200mm | PLANARIZATION |
| LAM RESEARCH CORP/LRC | 200 SERIES 2 | DOUBLE SIDED SCRUBBER | WSCpt | 200mm | PLANARIZATION |
| LAM RESEARCH CORP/LRC | 200 SERIES 2 | DOUBLE SIDED SCRUBBER | WSWwt | 200mm | PLANARIZATION |
| MATTSON TECHNOLOGY INC | 8108 | RTP GATE | RTPga | 200mm | DIFFUSION |
| METRON TECHNOLOGY | ECLIPSE | TI/NIV SPUTTER (C4) | MRCcf | 200mm | THIN FILMS |
| NANOMETRICS INC | Q7 | REGISTRATION | RT qs | 200mm | METROLOGY |
| NIKON INSTRUMENTS | 3A | OPTISTATION | OPTcu | 200mm | METROLOGY |
| NIKON PRECISION INC | 4425I | STEPPER | NSFfl | 200mm | LITHOGRAPHY |
| NIKON PRECISION INC | 9M(SF100) | EXPOSURE | SPIli | 200mm | LITHOGRAPHY |
| NIKON PRECISION INC | AM-601D | RETICLE INSPECTION | NARxx | N/A | LITHOGRAPHY |
| NIKON PRECISION INC | BODY 11 | STEPPER I-LINE | NSRrx | 200mm | LITHOGRAPHY |
| NIKON PRECISION INC | BODY 12 | STEPPER I-LINE | NSArx | 200mm | LITHOGRAPHY |
| NIKON PRECISION INC | BODY 9 | STEPPER I-LINE PI | NIKpi | 200mm | LITHOGRAPHY |
| NIKON PRECISION INC | S203 | DUV SCANNER, CU | NSBcu | 200mm | LITHOGRAPHY |
| NIKON PRECISION INC | S204 | 248nm (0.68NA) SCANNER | NSJli | 200mm | LITHOGRAPHY |
| NOVA MEASURING INSTRUMENTS LTD | 210 | NOVA 210 | NOVxx | 200mm | METROLOGY |
| NOVELLUS SYSTEMS INC | 04-8132929-00 | CHEM MONITORING SYSTEM, CU | CPMcu | N/A | METROLOGY |
| NOVELLUS SYSTEMS INC | AURA 2000 | ASHER (ETCH FRONT END) | GASfe | 200mm | ETCH |
| NOVELLUS SYSTEMS INC | CONCEPT 2 | W DEP | NVWxx | 200mm | THIN FILMS |
| NOVELLUS SYSTEMS INC | SABRE-XT | CU ELECTROPLATER AUTO | CUPcu | 200mm | THIN FILMS |
| NOVELLUS SYSTEMS INC | SEQUEL | NITRIDE ETCH STOP, CU | NEScu | 200mm | THIN FILMS |
| NOVELLUS SYSTEMS INC | SEQUEL | OXIDE DEPOSITION, TW, CU | NVZcu | 200mm | THIN FILMS |
| OKAMOTO (SINGAPORE) PTE LTD | VG 502 MK 11 8 | BACKSIDE GRINDER | GRNxx | 200mm | ASSEMBLY |
| RECIF INC | IDLW8 | OPTICAL CHARACTER READER | OCRxx | 200mm | WAFER HANDLING |
| RUDOLPH TECHNOLOGIES | CV9800 | AUGWARPAGE SYSTEM | AUGxx | 200mm | METROLOGY |
| RUDOLPH TECHNOLOGIES | METAPULSE 200 | ADHESION THICKNESS | RMPxx | 200mm | METROLOGY |
| SCP SERVICES INC | 9200 | AWS TAB/C4 CLEAN | AWScf | 200mm | ETCH |
| SCP SERVICES INC | 9200 | AWS TRIMIX BOE | AWStb | 200mm | ETCH |
| SCP SERVICES INC | 9400 | AWB NITRIDE ETCH | AWBnt | 200mm | ETCH |
| SCP SERVICES INC | 9415 | AWB BACK END | AWBbk | 200mm | ETCH |
| SCP SERVICES INC | 9415 | AWB BACK END (CU) | AWBcb | 200mm | ETCH |
| SCP SERVICES INC | 9415 | AWB TW #2 LITHO/TF-CU REGEN | AWBcr | 200mm | ETCH |
| SEMITOOL INC | CLASS II | CHEMICAL DELIVERY UNIT | CDUxx | N/A | FAB SUPPORT |
| SEMITOOL INC | STORM II | BOAT BOX CLEAN | BBCxx | 200mm | FAB SUPPORT |
| SEMITOOL INC | WST 308 | SOLVENT SPRAY PROCESSOR | SSPcf | 200mm | LITHOGRAPHY |
| TOKYO ELECTRON LTD/TEL | ACT 12-200 | DUAL BLOCK TRACK | JCT / PCT / UCX | 200mm | LITHOGRAPHY |
| TOKYO ELECTRON LTD/TEL | ACT 8 | SINGLE BLOCK TRACK | BCT / CCT / NCT / QCT | 200mm | LITHOGRAPHY |
| TOKYO ELECTRON LTD/TEL | ACT 8 | SPIN ON GLASS STAND ALONE TRACK | SOGli | 200mm | LITHOGRAPHY |
| TOKYO ELECTRON LTD/TEL | P8I | PROBER | TELfa | 200mm | TEST |
| TOKYO ELECTRON LTD/TEL | UNITY 2 | OXIDE / NITRIDE ETCHER | OXA | 200mm | ETCH |
| VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES | E1000 | IMPLANTER | IMPhx | 200mm | IMPLANT |
| VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES | E500 | EHP IMPLANTER | IMPeh | 200mm | IMPLANT |
| VERIGY US INC | V1316 | TESTER | VHPxx | 200mm | TEST |
300mm Inventory
| SUPPLIER NAME | MODEL | DESCRIPTION | CEID | WAFER SIZE | FUNCTIONAL AREA |
|---|---|---|---|---|---|
| AGILENT TECHNOLOGIES INC | 4500 | ICPMS | ICPxx | N/A | METROLOGY |
| APPLIED MATERIALS INC/AMAT | ELECTRA | CU ECP 300MM ELECTROPLATER | EPAcu | 300mm | THIN FILMS |
| APPLIED MATERIALS INC/AMAT | SEM VISION | REVIEW STATION, SEM DFCT, CU | SRScu | 300mm | METROLOGY |
| APPLIED MATERIALS INC/AMAT | ULTIMA X 300MM | ILD 1-N DEPOSITION, CU | ODPcu | 300mm | THIN FILMS |
| ASM AMERICA INC | EPSILON E3000 | EPI TOOL | EPIdi | 300mm | DIFFUSION |
| ASM AMERICA INC | EPSILON E3200 | EPI TOOL | EPIdx | 300mm | DIFFUSION |
| AXCELIS TECHNOLOGIES INC | ES3 | ASHER (ETCH) | ASHde | 300mm | ETCH |
| BRUKER NANO, INC | D5000 | ATOMIC FRC MICROSCOPE w/METRO HEAD | AFMmh | N/A | METROLOGY |
| CAMECA | SHALLOW PROBE | EPI DOPANT CONCENT,NC | EDCnc | 300mm | METROLOGY |
| CASCADE MICROTECH DRESDEN GMBH | PA300AA | C4 PROBING SYSTEM | CFPya | 300mm | C4 |
| HITACHI HTA | S-4160 | SEM | SEMhb | N/A | METROLOGY |
| HITACHI HTA | S9300 | CD SEM, 300mm | CDSli | 300mm | METROLOGY |
| KLA TENCOR CORPORATION | AIT UV | DARKFIELD INSP, CU | FDTcu | 300mm | METROLOGY |
| KLA TENCOR CORPORATION | ARCHER 10 | OVERLAY/REGISTRATION | OVLli | 300mm | LITHOGRAPHY |
| KLA TENCOR CORPORATION | ARCHER-10XT | OVERLAY REGISTRATION TOOL | OVLlc | 300mm | LITHOGRAPHY |
| MATTSON TECHNOLOGY INC | MODUTRACK RETIC | AUTOMATED RETICLE CLEANER | ARTli | N/A | LITHOGRAPHY |
| N & K TECHNOLOGY | N+K ANLYZR 1500 | REFLECTOMETER | REFxx | N/A | METROLOGY |
| NIKON INSTRUMENTS | OPTI VII | MICRO/MACRO INSPECTN SCOPE, CU | MIKcu | 300mm | METROLOGY |
| NIKON PRECISION INC | 9M(SF100) | EXPOSURE, PDPI, CU | SPIcu | 300mm | LITHOGRAPHY |
| NIKON PRECISION INC | S306 | 193nm, HIGH NA SCANNER | SNAli | 300mm | LITHOGRAPHY |
| RECIF INC | SPP300F04 | LOT SPLITTER | LSFnd | 300mm | WAFER HANDLING |
| RECIF INC | SPP300F05 | LOT SPLITTER | LSFnc | 300mm | WAFER HANDLING |
| SEZ AMERICA INC | SP304 | SPIN PROCESSOR | ZSZnc | 300mm | LITHOGRAPHY |
| TOKYO ELECTRON LTD/TEL | ACT12 | DUAL BLOCK FOR ASML AT:1100 | TAAli | 300mm | LITHOGRAPHY |
| TOKYO ELECTRON LTD/TEL | ACT12 | TRACK, PI HARD BAKE, CU | THBcu | 300mm | LITHOGRAPHY |
| TOKYO ELECTRON LTD/TEL | ACT12 | TRACK, PDPI, CU | TTKcu | 300mm | LITHOGRAPHY |
| ULTRATECH INCORPORATED | LA1300 | LASER ANNEAL | LTPim | 300mm | LITHOGRAPHY |
| ULTRATECH INCORPORATED | TITAN 300 | EXPOSE TOOL, C4 | CEXcf | 300mm | C4 |


